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Which consequence results when gate oxide diminishes below 2nm in CMOS?

A)Increased quiescent tunneling current
B)Improved transistor gain linearity
C)Lower subthreshold output resistance
D)Reduced gate-source breakdown voltage

💡 Explanation

Quiescent current increases because quantum tunneling dominates as gate oxide thickness decreases, therefore electrons pass directly through the insulating layer rather than being blocked; linearity changes less because drift effects dominate, rather than tunneling's voltage dependence.

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