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Which consequence results when imperfections influence integrated circuit photolithography?

A)Reduced feature resolution from diffraction
B)Increased etching rate from contamination
C)Elevated thermal noise limits operation
D)Unintended polarization alters electrical properties

💡 Explanation

Reduced feature resolution occurs because thin film interference generates destructive interference fringes during exposure. This interference is sensitive to any unevenness that violates ideal planarity; therefore, some regions receive insufficient light to properly polymerize the resist, rather than proper resolution.

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