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Which consequence results when sputtering target's magnetic field weakens?

A)Reduced plasma ionization efficiency occurs
B)Increased substrate film contamination appears
C)Elevated background gas pressure develops
D)Compromised cathode electron temperature results

💡 Explanation

Weakening the magnetic field reduces electron confinement near the target; therefore, reduced plasma ionization efficiency occurs because fewer ions are generated to bombard the target and maintain the sputtering process, rather than increasing contaminant incorporation.

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