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Which issue limits performance in double-gate MOSFETs when the gate oxide thins?

A)Increased electron quantum tunneling
B)Reduced carrier mobility overall
C)Higher channel thermal conductivity
D)Elevated gate dielectric breakdown

💡 Explanation

Increased electron leakage occurs because quantum tunneling permits electrons to pass through the gate oxide. The thin gate enhances tunneling probability; therefore, option A is right rather than dielectric breakdown or reduced mobility arising from different MOSFET limitations.

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