Live Quiz Arena
🎁 1 Free Round Daily
⚡ Enter ArenaQuestion
← ScienceWhich mechanism alters the thermal conductivity constant governing heat dissipation in a silicon wafer during laser annealing?
A)Phonon scattering due to lattice defects✓
B)Increased electron-hole recombination rates
C)Enhanced radiative heat transfer rates
D)Suppressed free carrier absorption limits
💡 Explanation
Phonon scattering due to lattice defects reduces thermal conductivity; laser annealing creates these defects. This increased scattering lowers the thermal conductivity constant, because imperfections impede phonon propagation. Therefore, option A is right, rather than alternatives which enhance heat transfer rates under these conditions.
🏆 Up to £1,000 monthly prize pool
Ready for the live challenge? Join the next global round now.
*Terms apply. Skill-based competition.
Related Questions
Browse Science →- Which mechanism causes signal leakage between adjacent superconducting qubits?
- Which mechanism limits current flow when shrinking CMOS transistor gate oxide thickness below 1nm?
- Which outcome reduces signal clarity when broadband light enters optical fiber?
- Which outcome occurs when deuterium-tritium fusion encounters high alpha particle concentrations?
- Which risk increases within an oil pipeline when the fluid velocity surpasses critical values?
- Which outcome occurs when pressurizing a Haber-Bosch reactor?
