VibraXX
Live Quiz Arena
🎁 1 Free Round Daily
⚡ Enter Arena
HomeCategoriesScienceQuestion
Question
Science

Which mechanism alters the thermal conductivity constant governing heat dissipation in a silicon wafer during laser annealing?

A)Phonon scattering due to lattice defects
B)Increased electron-hole recombination rates
C)Enhanced radiative heat transfer rates
D)Suppressed free carrier absorption limits

💡 Explanation

Phonon scattering due to lattice defects reduces thermal conductivity; laser annealing creates these defects. This increased scattering lowers the thermal conductivity constant, because imperfections impede phonon propagation. Therefore, option A is right, rather than alternatives which enhance heat transfer rates under these conditions.

🏆 Up to £1,000 monthly prize pool

Ready for the live challenge? Join the next global round now.
*Terms apply. Skill-based competition.

⚡ Enter Arena

Related Questions

Browse Science