VibraXX
Live Quiz Arena
🎁 1 Free Round Daily
⚡ Enter Arena
HomeCategoriesScienceQuestion
Question
Science

Which mechanism causes increased electron leakage when the gate oxide thickness in a MOSFET approaches quantum limits?

A)Quantum tunneling becomes substantial
B)Thermal fluctuations overwhelm confinement
C)Surface recombination gets amplified
D)Impurity scattering strongly dominates

💡 Explanation

Electron leakage increases because quantum tunneling probability increases exponentially as the oxide thickness decreases; therefore electrons can tunnel through the decreasing barrier rather than being confined, with thermal fluctuations being much smaller under such small sizes.

🏆 Up to £1,000 monthly prize pool

Ready for the live challenge? Join the next global round now.
*Terms apply. Skill-based competition.

⚡ Enter Arena

Related Questions

Browse Science