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← ScienceWhich mechanism causes increased electron leakage when the gate oxide thickness in a MOSFET approaches quantum limits?
A)Quantum tunneling becomes substantial✓
B)Thermal fluctuations overwhelm confinement
C)Surface recombination gets amplified
D)Impurity scattering strongly dominates
💡 Explanation
Electron leakage increases because quantum tunneling probability increases exponentially as the oxide thickness decreases; therefore electrons can tunnel through the decreasing barrier rather than being confined, with thermal fluctuations being much smaller under such small sizes.
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