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← ScienceWhich mechanism diminishes performance when integrated circuit gate oxide thickness decreases excessively?
A)Increased quantum tunneling current✓
B)Reduced channel mobility from phonon scattering
C)Enhanced electromigration of interconnects
D)Elevated junction leakage current
💡 Explanation
When gate oxide thickness shrinks, direct quantum tunneling occurs because the electrons pass through the insulating layer, leading to increased leakage current. Therefore increased tunneling current limits performance significantly, rather than reduced mobility, electromigration, or junction leakage which occur via independent mechanisms.
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