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Which mechanism enables current flow through an oxide layer in a metal-oxide-semiconductor (MOS) transistor below threshold voltage?

A)Quantum tunneling through potential barrier
B)Thermionic emission over potential barrier
C)Avalanche breakdown within the oxide layer
D)Hole accumulation at oxide interface

💡 Explanation

Below threshold voltage, quantum tunneling happens because electrons can probabilistically penetrate inherently thin potential barrier despite lacking sufficient energy, leading to observable current. Therefore, quantum tunneling is the right flow, rather than thermionic emission, breakdown, or hole accumulation because they depend on high fields or energy injection.

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