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Which mechanism influences increased threshold voltage drift in MOSFETs under prolonged gate bias at elevated temperatures?

A)Bias Temperature Instability (BTI)
B)Channel Length Modulation (CLM)
C)Velocity Saturation Effect (VSE)
D)Quantum Confinement Effect (QCE)

💡 Explanation

Bias Temperature Instability (BTI) causes threshold voltage drift because it involves charge trapping at the gate oxide interface promoted by thermal energy; therefore, increased drift occurs, rather than alternative effects from channel geometry or carrier velocity.

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