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Which mechanism limits electron flow through nanoscale flash memory transistors due to gate oxide thinning?

A)Increased quantum tunneling probability
B)Reduced channel mobility from surface roughness
C)Enhanced parasitic capacitance coupling
D)Elevated thermal noise within oxide layer

💡 Explanation

When the gate oxide thins, quantum tunneling increases because the potential barrier width decreases, raising the likelihood of electrons tunneling through the oxide and disrupting charge storage. Therefore, increased tunneling is a constraint, rather than mobility reduction, capacitance coupling, or thermal noise which involve distinct properties.

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