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Which mechanism limits etching precision on semiconductor wafers?

A)Quantum tunneling blurs feature edges.
B)Resist breakdown stops etching sooner.
C)Plasma divergence reduces ion density.
D)Charging causes anisotropic etching.

💡 Explanation

Quantum tunneling allows electrons to penetrate the potential barrier at the edges, rather than stopping abruptly; therefore the etching isn't perfectly sharp because electrons propagate beyond the defined feature edges blurring results.

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