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Which mechanism limits miniaturization inside integrated circuit transistors?

A)Electron tunneling through gate oxides
B)Electromigration causing void formation
C)Ohmic heating above Curie temperature
D)Capacitive parasitic inductance coupling

💡 Explanation

Electron tunneling limits miniaturization because, as gate oxides become thinner, electrons pass through via Quantum tunneling, leaking charge and disrupting normal operations; therefore, devices fail, rather than being limited by electromigration or classical parasitics, which are separate failure mechanisms.

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