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Which optical effect impairs lithographic resolution when illuminating silicon wafers?

A)Speckle contrast from partial coherence
B)Chromatic aberration in lens elements
C)Fresnel diffraction from mask edges
D)Birefringence within calibration optics

💡 Explanation

Increased illumination increases speckle contrast because lower spatial coherence yields a more granular intensity distribution; therefore, resolution suffers, rather than from chromatic aberration that can be precisely corrected on modern machines.

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