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Which outcome accelerates plasma deposition when increasing substrate temperature?

A)Increased surface reaction rate
B)Enhanced ion bombardment defects
C)Reduced precursor sticking coefficient
D)Elevated plasma electron temperature

💡 Explanation

Increased substrate temperature enhances reactant molecule kinetics via the Arrhenius equation because it provides requisite activation energy. Therefore, surface reactions creating the desired deposition product accelerate rather than being limited by surface residence time or plasma parameters.

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