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← ScienceWhich outcome increases within a semiconductor's gate oxide layer under high electric field stress?
A)Electron tunneling probability✓
B)Capacitance density plateau
C)Dielectric breakdown voltage
D)Minority carrier concentration
💡 Explanation
Increased field stress enhances **quantum tunneling** through the gate oxide, because the thinner the barrier implies greater probability of electron penetration; therefore enhanced electron tunneling leakage occurs, rather than increased capacitance because different mechanisms dictate the phenomena.
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