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← ScienceWhich outcome jeopardizes the writing precision of an EUV lithography system?
A)Reduced beam coherence effects✓
B)Increased stochastic photon arrival
C)Enhanced plasma mirror reflectivity
D)Improved heat sink thermal capacity
💡 Explanation
Reduced beam coherence smears the projected mask image because the **interference** fringes become indistinct, therefore line edge roughness increases, rather than achieving crisp lines; stochastic photon arrival contributes noise but isn't primary.
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