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← ScienceWhich outcome occurs due to electron scarcity in deep submicron transistors?
A)Increased gate oxide leakage✓
B)Suppressed drain-induced barrier lowering
C)Decreased transistor threshold voltage
D)Enhanced channel hot carrier injection
💡 Explanation
Increased gate oxide leakage occurs because decreased channel length accentuates **quantum tunneling** through the thin gate oxide. Thus electrons tunnel through the gate oxide barrier rather than following lower resistance paths, therefore creating leakage, not reduced barrier lowering.
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