Which outcome occurs when a plasma etcher's RF power exceeds thermal limits?

💡 Explanation

Increased RF power leads to excessive process gas dissociation via collisional excitation, therefore generating more reactive radicals, and intensifying surface reactions to form more volatile byproducts, rather than stabilizing the plasma as would occur normally.

• Which mechanism destabilizes molecular geometries with antibonding orbitals?
• Which outcome results from exceeding the Nyquist rate when digitizing a continuous analog signal?
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• Which effect upon electromagnetic radiation results when passing near blackhole?
• Which limitation affects heat extraction efficiency in a Carnot engine operating in a refrigeration cycle with minimal temperature differential?
• Which type of lattice distortion occurs in a crystal during piezoelectric actuation?