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Which outcome occurs when a silicon etchant contacts silicon nitride?

A)Selective surface passivation occurs
B)Silicon bonds selectively oxidize
C)Uniform etching is always achieved
D)Etch rate remains unaffected

💡 Explanation

Selective passivation occurs because silicon nitride masking prevents attack of silicon underneath and stops etching via the masking effect from modified covalent bonds; therefore, masking layers remain on silicon, rather than silicon undergoing non-selective dissolution, which occurs in absence of the mask.

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