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Which outcome occurs when excessive gate leakage current affects a nanoscale flash memory cell?

A)Data retention time diminishes rapidly
B)Cell programming becomes exceptionally faster
C)Read disturb events are drastically reduced
D)Threshold voltage window range widens

💡 Explanation

Decreased data retention is caused by electrons leaking from the floating gate through quantum tunneling. Because electrons tunnel through the oxide rather than being confined, trapped charge diminishes, therefore shortening the data retention; faster performance becomes unimportant.

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