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Which outcome occurs when increased temperature fluctuations destabilize laser interference lithography?

A)Reduced minimum feature size achieved
B)Elevated intensity threshold uniformity
C)Exaggerated resist pattern irregularities
D)Improved process window stabilization

💡 Explanation

Increased temperature gradients in the optical elements cause thermal expansion, resulting in random refractive index changes. This distorts the interference pattern itself because distortion causes spurious variations to arise, eventually producing resist irregularities rather than uniformity therefore, creating pattern imperfections.

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