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Which outcome occurs when polysilicon gate doping decreases in a MOSFET?

A)Threshold voltage magnitude increases notably
B)Drain current saturation velocity increases
C)Subthreshold swing maintains fixed value
D)Gate oxide leakage current is minimized

💡 Explanation

Increased depletion region width at the gate interface due to insufficient doping results in larger voltage required to establish the channel – a consequence of charge carrier starvation. Therefore, the threshold voltage magnitude increases rather than subthreshold swing being constant even with lower doping because the channel doping remains the same.

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