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Which outcome results from imperfections in multi-layer interference mirrors inside an extreme ultraviolet lithography system?

A)Decreased reflected light intensity overall
B)Increased numerical aperture of the lens
C)Improved mask pattern diffraction sharpness
D)Enhanced photoresist chemical reaction rate

💡 Explanation

Decreased reflected light happens because constructive and destructive interference is altered by thickness variations from design; therefore, reflectivity drops, rather than enhanced numerical aperture effects on the diffraction, which depend on lens shape.

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