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Which outcome results when dopant concentration limits gate oxide integrity?

A)Increased electron tunneling current
B)Reduced channel carrier mobility
C)Elevated junction breakdown voltage
D)Improved subthreshold swing control

💡 Explanation

Increased dopant concentration causes Trap-Assisted Tunneling because it introduces defects in the silicon dioxide layer;therefore, the electron tunneling current rises rather than improving performance, which reduced mobility, or changed properties.

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