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← ScienceWhich outcome results when dopant concentration limits gate oxide integrity?
A)Increased electron tunneling current✓
B)Reduced channel carrier mobility
C)Elevated junction breakdown voltage
D)Improved subthreshold swing control
💡 Explanation
Increased dopant concentration causes Trap-Assisted Tunneling because it introduces defects in the silicon dioxide layer;therefore, the electron tunneling current rises rather than improving performance, which reduced mobility, or changed properties.
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