Which phenomenon limits scaling feature size in semiconductor manufacturing using deep ultraviolet lithography?

💡 Explanation

When feature sizes approach a few nanometers, quantum tunneling causes electrons to 'leak' through insulating layers because there's a non-zero probability of wave function penetration through classically forbidden regions. Therefore quantum tunneling fundamentally limits miniaturization, rather than outgassing, aberration or plasma damage, mechanisms governed by different physical properties or process control issues.

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