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← ScienceWhich risk increases due to imperfections during nanoimprint lithography?
A)Increased thin film delamination rates
B)Reduced microfluidic mixing efficiency
C)Substrate mechanical resonance frequencies shift
D)Compromised optical interference pattern fidelity✓
💡 Explanation
Compromised optical interference pattern fidelity increases because nanoimprint lithography leverages the **interference** of light to generate fine patterns. Deformations disrupt the intended interference, therefore pattern accuracy suffers, rather than other mechanical or fluid-related outcomes.
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