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Which risk increases during pulsed laser deposition using plasma?

A)Particulate film contamination develops
B)Slower crystal growth rate occurs
C)Target material loss decreases
D)Lower substrate temperatures decrease

💡 Explanation

Particulate film contamination develops frequently during laser ablation because Knudsen layer formation allows larger ejected clusters to propagate forward rather than decompose completely; therefore, the result is target material agglomeration which adds impurities.

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