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Which risk increases for data integrity in flash memory, assuming continuous operation near its voltage limit, due to repeated read operations?

A)Increased electron tunneling through oxide
B)Reduced channel hot carrier injection
C)Elevated bitline capacitance coupling
D)Decreased threshold voltage stability

💡 Explanation

Increased electron tunneling degrades the oxide layer, because the Fowler-Nordheim tunneling mechanism allows electrons to escape the storage cell, therefore causing data loss, rather than the injected carrier effects, which are associated with writing.

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