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Which risk increases when a gate oxide thins?

A)Electron quantum tunneling probability increases
B)Ohmic resistance of channel increases
C)Thermal junction temperature steadily decreases
D)Majority carrier mobility increases locally

💡 Explanation

Reduced oxide thickness yields higher electric field. This raises the electron quantum tunneling probability through gate dielectric isolation, which cause leakage, therefore, rather than changes in resistance because tunneling is an quantum effect, and the temperature would respond to the higher current.

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