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Which risk increases when a laser etching system exceeds duty cycle limits?

A)Wavefront dislocations distort etching pattern
B)Gain medium suffers thermal runaway
C)Polarization drift invalidates chiral patterns
D)Stimulated emission degrades etchant profile

💡 Explanation

Thermal runaway risk increases because absorption exceeds dissipation, driving exponential temperature gains— the process of positive feedback. This causes irreversible component failure, therefore thermal runaway rather than pattern distortion due to imperfect beam alignment.

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