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← ScienceWhich risk increases when electron beam lithography resolution declines?
A)Reduced etching pattern fidelity✓
B)Lower beam current stabilization
C)Increased resist layer uniformity
D)Decreased proximity effect correction
💡 Explanation
Reduced resolution causes imprecise electron beam placement, leading to etching errors because diffraction increases. Therefore, pattern fidelity decreases, rather than changes in current, uniformity, or proximity correction, which relate to beam control itself.
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