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Which risk increases when the insulating oxide layer thins excessively in a Flash EEPROM cell?

A)Data corruption via electron tunneling
B)Increased parasitic capacitance coupling
C)Elevated thermal runaway threshold
D)Reduced channel carrier mobility

💡 Explanation

Data corruption rises because reduced oxide thickness increases the probability of quantum tunneling; stored electrons leak from the floating gate. Therefore, the data retention time decreases, rather than the transistor properties failing because of thermal effects.

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