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Which risk significantly increases when an NMOS transistor operates with a high drain-source voltage?

A)Avalanche breakdown occurs more frequently
B)Thermal runaway initiates oscillation instability
C)Subthreshold leakage abruptly increases
D)Gate oxide wear reduces efficiency

💡 Explanation

Avalanche breakdown escalates with high drain-source voltage because impact ionization generates electron-hole pairs, thus multiplying carriers; this sharply increases current. Therefore, breakdown risk rises, rather than purely thermal runaway or subtle gate degradation initiating first under these conditions.

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