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← ScienceIn continuously injected chemical vapor deposition, which mechanism limits film deposition rate?
A)Surface adsorption✓
B)Bulk material strength
C)Thermal conductivity mismatch
D)Substrate lattice parameter
💡 Explanation
Surface adsorption limits the film growth rate because the precursor molecules must adhere for deposition; therefore, adsorption dynamics control growth rather than bulk properties or unrelated parameters.
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