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Which mechanism causes increased electron tunneling across semiconductor interfaces in strained silicon MOSFETs?

A)Crystal lattice spacing alteration widens depletion
B)Quantum confinement raises energy barriers
C)Orbital hybridization lowers effective mass
D)Phonon scattering increases carrier velocity

💡 Explanation

Orbital hybridization modifies the band structure; therefore the effective electron mass decreases, augmenting tunneling probability because the electrons behave as increasingly delocalized waves, rather than localized particles. Phonon scattering and widened depletion regions alter classical conductivity.

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