Which outcome limits transistor density when quantum mechanical models are applied to MOS structures?

💡 Explanation

Increased gate oxide tunneling current limits further scaling because electrons penetrate the gate dielectric via quantum tunneling, which increases off-state leakage and power consumption within the channel, rather than other scattering effects.

• Which risk increases when a turbine blade's gamma prime (γ') precipitates coarsen in the nickel-based superalloy lattice?
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• Which outcome arises due to quantum tunneling in a resonant tunneling diode when applied voltage aligns energy levels?
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