Which outcome occurs when graphite experiences high temperature plasma etching in semiconductor fabrication?

💡 Explanation

When graphite is exposed to high temperature plasma etching, reactive fluorine radicals abstract carbon atoms, forming volatile carbon fluorides because the covalent carbon-carbon bonds in graphite are broken. Therefore, volatile carbon fluorides are formed, rather than recrystallization, intercalation, or oxidation which require different thermodynamic conditions or presence of other reactants.

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