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← ScienceWhich outcome occurs when photoresist is overexposed during lithography?
A)Decreased feature resolution occurs✓
B)Increased pattern edge sharpness
C)Improved etch resistance results
D)Enhanced adhesion to substrate arises
💡 Explanation
Overexposure causes increased crosslinking via **photopolymerization**, broadening the developed features; therefore resolution decreases, because features are larger than intended, rather than sharper, especially since development kinetics now involve more photoresist.
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