Which outcome sharply increases the etching rate as photoresist diminishes?

💡 Explanation

Reactive ion etching rate increases dramatically at pinholes as the photoresist erodes because increased plasma exposure accelerates etching through these thin spots, therefore a breakthrough event occurs rather than steady uniform material removal.

• Which effect becomes prominent when spacecraft velocity approaches relativistic speeds?
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• Which outcome causes the energy splitting when degenerate atomic orbitals form molecular bonds?
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