Which property arises in semiconductor fabrication when annealing incomplete atomic layer deposition films?

💡 Explanation

Enhanced uniformity arises because surface diffusion minimizes the total surface energy; the driving mechanism being Ostwald ripening. Larger dots grow at the expense of smaller ones, therefore narrow size distributions result, rather than mobility or resistance improvements.

• Which risk increases when transmitting a high-power laser beam through atmospheric turbulence?
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• Which outcome reduces pressure work from a Carnot engine?
• Which risk increases when high-pressure hydrogen gas encounters embrittled steel?
• Which risk increases when a low-volatility refrigerant leaks from a refrigeration cycle operating beyond design?
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