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Which risk increases in a flash memory cell when the tunnel barrier's thickness decreases?

A)Increased quantum tunneling probability
B)Decreased data retention time
C)Reduced program/erase cycling endurance
D)Elevated cell threshold voltage variation

💡 Explanation

Decreasing barrier thickness elevates the **Fowler-Nordheim tunneling** probability; charge can leak from the floating gate because greater tunneling allows electrons to escape more easily, therefore the data retention time decreases rather than remaining stable as other failure modes increase.

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