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Which risk increases when a high-power laser etcher exceeds design irradiance?

A)Increased plasma formation on the surface
B)Reduced beam polarization ellipticity
C)Decreased material ablation efficiency
D)Enhanced two-photon absorption rate

💡 Explanation

Increased irradiance beyond the design limit amplifies light absorption due to Inverse Bremsstrahlung, thus generating more plasma. Because excess plasma shields the material rather than ablating it efficiently, the energy transfer becomes less effective, rather than resulting in two-photon effects.

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